Nanofabrication facility

The Nanofabrication Facility focuses on the design and development of nanofabrication methods and techniques for basic and applied research in nanoscience and nanotechnology. It provides researchers and students an extensive range of processing services to help them carry out their research activities. It also offers support, assistance and training to allow the researchers and other users to safely and efficiently operate the equipment available. The facility is designed to support the fabrication and characterisation of nanoscale materials and structures, and the integration of devices at all length scales.

The facility’s mission is to provide high quality services to both internal and external users. 

Available techniques

  • Electron-beam lithography (EBL)
  • Focused ion beam lithography (FIB)
  • Thermal and UV-nanoimprint (NIL)
  • Atomic-force microscopy (AFM)
  • E-beam evaporation
  • Sputter coating
  • Plasma cleaning
  • Wedge bonding
  • Spin coating
  • Optical Microscopy
  • 3D optical profiler
  • Stylus profilometer