Main Research Lines
- Advanced Nano-manufacturing
- Large Area Nanoimprint Lithography
ICN2 offers step and repeat nanoimprint lithography services for upscaling of micro and nano scale devices and structures. It is possible to enlarge micro and nano structured active areas from few square mm to up to 300 mm areas.
This advanced manufacturing technology has been developed to a state where 3-dimensional and sub 50 nm patterning is a feasible task, demonstrating high throughput capabilities.
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Dr Nikolaos Kehagias graduated from the Physics department of Aristotle University in Thessaloniki, Greece in 2002. He has a Master degree in “Physics of laser communications” from Essex University, UK. He obtained his PhD in 2007 from the National university of Ireland, Cork where he continued to work as a post doctoral fellow until May 2008.
He joined the ICN in May 2008, first as member of the Phononic and Photonic Nanostructures Group. In 2010 he became Division Leader of the Nanofabrication Division and since 2014 he leads the Flexible Nanofabrication Platfom.