- Title
- VO2 domains across the Meta-Insulator Transition: Electrical footprint
- Technique
- Scanning Kelvin Probe Microscopy (SKPM), an atomic force microscopy (AFM) mode.
- Description
- 50x50 um image showing the effect of local strain-relaxation in the surface potential of VO2 domains across the metal-insulator transition.
View image
- Technical specifications
- Surface potential image taken with an Asylum MFP-3D atomic force microscope in a SKPM mode. The tip used was a PPP-EFM (Nanosensors) with Pt/Ir coating on either the tip and detector side. The scan was carried out in air at 20ºC.