Inspecting nanostructures

To meet the increasing demand for smaller, faster devices, a continued decrease in the feature size of components is required. For the sub-20 nm node, block copolymer (BCP) based technologies present promising cost-effective alternatives to overcome the fabrication challenges of established lithographic techniques. BCPs are a robust platform to generate patterns with nanostructures on the 5-100 nm scale and their directed self-assembly has permitted to achieve highly ordered one-dimensional (lines) and two dimensional (hexagonal dots) arrays. Specialized metrology is required for accurate dimensional and defect analysis of these type of nanostructures.

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