Nanofabrication facility

Thursday, 08 March 2018

Contact us

Contact us

Phone +34 937 37 36 45

Email This email address is being protected from spambots. You need JavaScript enabled to view it.

Address

Edifici ICN2.
Campus de la UAB
08193 Bellaterra
Spain

Hours
Reception is staffed between 9am and 5pm, Monday to Friday

Thursday, 08 March 2018

Nanofabrication facility - Collaborations

Collaborations

Nanolito Spain

Nanolito is the Spanish Network of Nanolithography. Nanolito has been financed from 2009 to 2014 by the Ministry of Science through complementary actions. For 2016 and 2017, MINECO finances the Network of Excellence in Nanolithography, with the purpose of exchanging and transferring knowledge among Spanish agents (research groups, centers and companies) in the field of nanolithography.

Since its creation, Nanolito intends to optimize the use and coordination of the scientific-technological infrastructures that exist today in Spain in the field of Nanolithography. The funding obtained is mainly devoted to holding meetings and workshops, organizing summer schools and financing short stays.

Link: http://unizar.es/nanolito

The Scientific Committee of Nanolito is formed by the following people:

  • Dr. José María De Teresa (ICMA, Zaragoza), Coordination
  • Dr. Francesc Pérez-Murano (CNM, Barcelona)
  • Dr. Clivia Sotomayor (ICN2, Barcelona)
  • Dr. Albert Romano (UB, Barcelona)
  • Dr. Ricardo García (ICMM, CSIC, Madrid)
  • Dr. José Luis Prieto (ISOM-UPM, Madrid)
  • Dr. Santos Merino (Tekniker, Basque Country)
  • Dr. José Ignacio Martín (UNIOVI, Asturias)
  • Dr. Luis Hueso (NanoGUNE, San Sebastián)
  • Dr. José Luis Vicent (UCM, Madrid)

NIL Platform

The scope of ICN2 Nanoimprint Lithography (NIL) Platform is to centralize our knowhow and expertise in flexible nano-patterning methods, materials engineering and nano-metrology techniques in order to build a common technological platform which will focus on the integration of interdisciplinary technologies, develop human capital, and promote technology transfer.

ICN2 Nanoimprint Lithography platform focuses on developing and implementation of novel nano-patterning techniques suitable for large scale nano-manufacturing processes. We offer services and innovative solutions along the complete manufacturing value chain providing inexpensive and start of the art solutions.

From concept to final prototype demonstration we exploit all possible solutions form material engineering to novel nano-patterning techniques to create nano-enabled devices and surfaces. In principle, we utilise imprint based methods to pattern hybrid material and surfaces in a cost efficient and feasible manner, generating functional and valuable components and surfaces.

Our experience working with industrial and academic entities allows us to perform high quality research, keeping a dynamic relationship with state of the art technological developments in the field of nanoscience and nanotechnology. Working from the low TRL levels up to the mid-highs we address all the independent components for a successful outcome.

Link: https://icn2.cat/en/nanoimprint-lithography-platform

Impact

Added functionality by introducing micro/nano structures on surfaces will have a big impact on various industrial sectors. Sustainable production as well as products can be expected by our novel manufacturing approach enhancing the performances of the targeted products by improved functionality and keeping the production cost-effective.

Key innovations in process-efficient imprinting techniques can result in an entirely new generation of devices and products when combined with high-resolution direct printing of functional materials. Recent manufacturing technologies have advanced to the stage where inexpensive replication of high performance devices and components over large area and high volume production promise to revolutionize advanced manufacturing.