Available techniques

• Electron-beam lithography (EBL)
• Focused ion beam (FIB)
• Direct write laser UV lithography (DWL)
• UV mask aligner
• Thermal and UV-nanoimprint lithography (NIL)
• E-beam evaporation
• ICP-RIE plasma dry etching
• Plasma cleaning
• Wedge wire bonding
• Spin coating
• Optical microscopy
• 3D optical profiler
• Stylus profilometer