Manufacturer: AJA International Inc. Model: ATC-8E Orion 10kV HV source (Telemark) Substrates size: up to 4” wafers, rotation holder. Source materials available: gold, platinum, silver, aluminium, titanium, chromium, iron, cobalt, nickel, copper and alumina. The system contains 6 material pockets source (rotary pocket) for deposition of multilayers. Cryopumped main chamber, vacuum range: up to 1x10-8 mbar Turbopumped loadlock chamber, vacuum range: up to 2x10-7 mbar
Manufacturer: Laurell Tech.Corporation Model: WS400BZ-6NPP LITE Rotational speed: 100 to 12.000 rpm. Vacuum chucks: 45mm diameters for 4” wafers. Small fragment chuck adapter: 3 to 10 mm
Manufacturer: Kloé Model: Delise 250 • Light source: 365nm UV Laser • Compatible with standard photoresists (AZ, SU8, Shipley) • Substrate sizes: from 2x2mm up to 4” wafers • Minimum linewidth: 1um • Alignment accuracy: 1um • Three writing modes: vectorial, scanning or a combination of both • The system accepts GDSII, CIF and DXF formats The Direct Write Laser Lithography has received funds from the CENanoTech project. In turn, the CENanoTech projectThe CENanoTech project (ref.: 2015 FEDER/S-16) is funded through the call for the development of R&D infrastructures launched by the Regional...
Manufacturer: Raith GmbH Model: eLINE Plus High stability Schottky field emission gun HV energy: 20eV - 30keV Probe current: 5pA to 20nA Fast 20MHz Pattern Generator Laser interferometer stage (1nm positioning resolution) Up to 4”wafer substrate size (non-standard 6” option also available) Equipped with loadlock for easy and fast samples loading Single Gas Injection System (GIS) enables the deposition of finely shaped metallic (Pt, W) and insulating (SiO 2) microstructures (EBID, IBID) Raith proprietary Traxx and Periodixx (large area stitching free modes) available True multi user management...
Manufacturer: Kloé Model: KUB 3 • Light source: 365nm UV LED • Power density: 35mW/cm2 • Compatible with standard photoresists (AZ, SU8, Shipley) • Substrate sizes: from 2x2mm up to 100x100mm • Mask size: 5” • Minimum linewidth: 2um • Alignment accuracy: 1um • Colour touchscreen The UV Photolithography has received funds from the CENanoTech project. In turn, the CENanoTech projectThe CENanoTech project (ref.: 2015 FEDER/S-16) is funded through the call for the development of R&D infrastructures launched by the Regional Ministry of Economy and Knowledge, of the Generalitat de Catalunya, with...
Manufacturer: PVA TePla Inc. Model: PS210 Processing gases available: Oxygen or air plasma (Ar on request) Quartz chamber dimensions: 150mm dia x 150mm long Microwave system: 600W, 2.456 GHz with matched magnetron, air cooled Gases flow: up to 500sccm Graphic colour touch screen for control and monitoring
Manufacturer: Oxford Instruments Model: PlasmaPro Cobra 100 Sample sizes: from small chips up to 8” wafers Process Gases: CHF 3, CF 4, SF 6, C 2F 8, Ar, O 2, N 2 ICP Power: 3kW RIE Power: 600W Standard operating temperature 20ºC He backside cooling Equipped with laser endpoint detection The ICP-RIE has received funds from the CENanoTech project. In turn, the CENanoTech projectThe CENanoTech project (ref.: 2015 FEDER/S-16) is funded through the call for the development of R&D infrastructures launched by the Regional Ministry of Economy and Knowledge, of the Generalitat de Catalunya, with...
Manufacturer: Nikon Instruments Inc. Model: Eclipse LV100DA Episcopic and diascopic illumination. Epi-illuminator with 100W halogen lamp (brightfield, darkfield, or polarized observations) Dia-illuminator with 50W halogen lamp (brightfield and polarized observation) Microscope objective lenses: 5x, 10x, 20x, 50x and 100x. Automatic x-y stage controller, 15x10mm. Microscope camera head (5M pixels CCD) for image and video acquisition. NIS-Elements Imaging Software
Manufacturer: KLA Tencor Inc. Model: Alphastep D500 2μm diamond tip stylus Vertical resolution: 1nm Vertical measurement range: 1nm to 1.2mm Scan size: up to 30mm Force range: 0.03mg to 15mg Manual X-Y stage, up to 4” wafer size Microscope camera for positioning The Stylus Profilometer has received funds from the CENanoTech project. In turn, the CENanoTech project (ref.: 2015 FEDER/S-16) is funded through the call for the development of R&D infrastructures launched by the Regional Ministry of Economy and Knowledge, of the Generalitat de Catalunya, with funding received from the European...
Manufacturer: Filmetrics Inc. Model: Profilm 3D PSI and VSI modes Vertical range: 0-3μm (PSI), 50nm-10mm (VSI) Stage size: 100x100mm automatic Vertical Resolution: 0.1nm (PSI), 1nm (VSI) Field size: 0.03mg to 15mg Manual X-Y stage 2.0x1.7mm (10x objective) Lateral resolution: 1μm The Optical 3D Profiler has received funds from the CENanoTech project. In turn, the CENanoTech projectThe CENanoTech project (ref.: 2015 FEDER/S-16) is funded through the call for the development of R&D infrastructures launched by the Regional Ministry of Economy and Knowledge, of the Generalitat de Catalunya, with...
Manufacturer: Digital Instruments Inc. Model: MultiMode MM-AFM2 Scanner: 125 μm x 125 μm in area with 5 μm vertical range Sample size: max. 12 mm x 12 mm in area and 5mm thick Nanoscope IIIa controller: 16bit resolution on all three axes Contact and Tapping mode Can map out magnetic domains using magnetic-force microscopy, charge distribution using electrostatic force microscopy, density of states using scanning tunnelling microscopy, and elastic properties using force modulation imaging.
Manufacturer: Obducat AB Model: NIL-2.5 system Substrate size: 10 to 65 mm in diameter (2.5”) Temperature range: up to 250°C Operating pressure range: from 5 up to 70 bar Pressure applied hydraulically, thus leading to a process uniformity of 10 nm on the maximum surface available. The design of the heater provides a homogeneous temperature distribution across the whole imprint area.
