Staff directory Joaquín Eduardo Medina Dueñas

Joaquín Eduardo Medina Dueñas

Doctoral Student
FPI-SO 2021
joaquin.medina(ELIMINAR)@icn2.cat
Theoretical and Computational Nanoscience

Publications

2015

  • Residual layer-free Reverse Nanoimprint Lithography on silicon and metal-coated substrates

    Fernández A., Medina J., Benkel C., Guttmann M., Bilenberg B., Thamdrup L.H., Nielsen T., Sotomayor Torres C.M., Kehagias N. Microelectronic Engineering; 141: 56 - 61. 2015. 10.1016/j.mee.2014.11.025. IF: 1.197

    In this work we demonstrate that Reverse Nanoimprint Lithography is a feasible and flexible lithography technique applicable to the transfer of micro and nano polymer structures with no residual layer over areas of cm2 areas on silicon, metal and non-planar substrates. We used a flexible polydimethylsiloxane stamp with hydrophobic features. We present residual layer-free patterns imprinted using a commercial poly(methylmethacrylate) thermoplastic polymer over silicon, nickel and pre-patterned substrates. Our versatile patterning technology is adaptable to free form nano structuring and has coupling to adhesion technologies. © 2014 Elsevier B.V. All rights reserved.