Novel nanofabrication processes will be made possible thanks to these two new state-of-the-art tools, bought thought a project funded by the Spain Statal Research Agency and the European Union (Next Generation programme).
The ICN2 Nanofabrication Facility will house two new high-end state-of-the art systems: one ultra-high resolution electron beam lithography system and a PVD system for thin film deposition.
The ultra-high resolution EBL system is an eLINE Plus system from Raith GmbH which is a powerful, modularly expandable research tool uniting the worlds of advanced electron beam lithography (EBL), nanoengineering, and ultra-high resolution imaging & analysis. The system is equipped with 30keV Thermal Field Emission (TFE) filament technology offering down to 8nm lithography resolution in all operational modes on substrates up to 4” wafers. This system with its state-of-the-art laser interferometer-controlled stage ensures movement and pattern placement accuracies in the nm-regime and free-stitching patterning on large areas. It is also equipped with a gas injection system (GIS) for electron-beam induced deposition (EBID) which will allow the patterning of thin metal electrodes (Pt,W) with few nm lateral resolution.
The PVD thin film deposition system is an EVA451/601 system from Alliance concept equipped with ebeam gun, DC sputter target and ion gun source. This system is fully automatically controlled by software and it will allow the thin film deposition of a wide range of different materials with nm precision in thickness. It will be compatible with substrates up to 6” diameter and it will be equipped with a loadlock chamber to always keep the main chamber in good vacuum condition.
This action aims to equip the common service provided by the Nanofabrication Facility with two unique and state-of-the-art systems in the field of nanofabrication. This new equipment will be installed and ready to use before the end of 2023 and they will contribute to develop novel nanofabrication processes and devices that can be applied in a wide range of research fields.
Este equipamiento es parte del proyecto EQC2021-007544-P financiado por MCIN/AEI/10.13039/501100011033 y por la Union Europea NextGenerationEU/PRTR.
