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Wednesday, 16 October 2019

The new Nanofabrication Facility is already fully equipped and it starts standard operation

It offers the complete range of equipment in the three main processes involved in the fabrication of micro/nano devices: lithography, etching and thin film deposition.

After some period of time under commissioning stage, the new Nanofabrication Facility reached its full equipment offer after the installation of the two ebeam evaporators coming from the previous location of the facility. With this last equipment installation the Nanofabrication Facility finally offers the complete range of equipment and processes needed to support the research activity in this area. The facility offers state-of the art equipment in the main three processes involved in the fabrication of micro/nano devices: lithography, etching and thin film deposition. It is structured in three environmentally controlled rooms, one for each of the previous mentioned areas. You can find more detailed information on all of the installed systems and services in the Nanofabrication Facility webpage.

Primarily aimed at research groups, the facility follows the philosophy of the ICN2’s Research Support Division as a whole: to serve as a meeting point for scientists from different disciplines and a catalyst for the mutual sharing and exchange of knowledge, approaches and processes. With work led by Severo Ochoa research engineer, Dr Raúl Pérez Rodríguez, this facility constitutes a significant addition to the ICN2 scientific infrastructure, especially in light of its renewed goals to bring more of its technologies closer to market.

The CENanoTech project (ref.: 2015 FEDER/S-16) was funded through the call for the development of R&D infrastructures launched by the Regional Ministry of Economy and Knowledge of the Generalitat de Catalunya using funding received from the European Regional Development Fund. Funds were also allocated from the ICN2 Severo Ochoa Programme 2014-2018 granted by the Spanish Ministry of Economy, Industry and Competitiveness.