Electron Beam Lithography (EBL)
Electron beam lithography (EBL) is a fundamental technique in nanofabrication. It is maskless form of lithography used for the fabrication of micro- and nanostructures.
In EBL, a focused beam of electrons is used to form a designed pattern across a sample covered with electron sensitive thin resist film. Structures with micro- and nanometric dimensions are created in the resist and subsequently transferred to the substrate material by either etching or lift-off processes.
The eLINE Plus system from Raith GmbH is a powerful, modularly expandable research tool uniting the worlds of advanced electron beam lithography (EBL), nanoengineering, and ultra-high-resolution imaging & analysis. The system is equipped with 30keV Thermal Field Emission (TFE) filament technology offering down to 8nm lithography resolution in all operational modes on substrates up to 4” wafers. This system with its state-of-the-art laser interferometer-controlled stage ensures movement and pattern placement accuracies in the nm-regime and free-stitching patterning on large areas. It is also equipped with a gas injection system (GIS) for electron-beam induced deposition (EBID) which will allow the patterning of thin metal electrodes (Pt,W) with few nm lateral resolution.
Technical specifications
Manufacturer: Raith GmbH
Model: eLINE Plus
- High stability Schottky field emission gun
- HV energy: 20eV - 30keV
- Probe current: 5pA to 20nA
- Fast 20MHz Pattern Generator
- Laser interferometer stage (1nm positioning resolution)
- Up to 4”wafer substrate size (non-standard 6” option also available)
- Equipped with loadlock for easy and fast samples loading
- Single Gas Injection System (GIS) enables the deposition of finely shaped metallic (Pt, W) and insulating (SiO2) microstructures (EBID, IBID)
- Raith proprietary Traxx and Periodixx (large area stitching free modes) available
- True multi user management by user authentication and related specific system setup and parameter administration; Users find their system as they have left it
Este equipamiento es parte del proyecto EQC2021-007544-P financiado por MCIN/AEI/10.13039/501100011033 y por la Union Europea NextGenerationEU/PRTR
Contact
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Raúl Pérez Rodríguez
Senior Laboratory Officer for the Nanofabrication Laboratory
raul.perez(ELIMINAR)@icn2.cat
Tel. +34937373645
Associated Groups/Units