Lithography
Micro-nano lithography is the process by which a pattern is written or transferred to a substrate. The process can be physical in nature, utilising a ‘stamp’ to press structures into a softer material, or chemical using light, ions or electron energy to write into photo and electron sensitive resists. This is necessary for the creation of the nanoscale components featured in nearly all modern technologies. ICN2 Nanofabrication Facility offers several different lithographic techniques and instruments, which are briefly listed and shown below.
| Process | Max. res. | Energy used | Instrument |
|---|---|---|---|
| Electron Beam Lithography (EBL) | 8nm | 30keV | Raith eLINE Plus |
| Direct Write Laser Lithography | 1um | UV | Kloé Dilase 250 |
| UV Photolithography (Mask aligner) | 2um | UV | Kloé KLUB 3 |
| Spin coater | NA | NA | Laurell Tech. WS400BZ-6NPP LITE |