Nanofabrication facility - Equipment - Lithography
Lithography
Micro-nano lithography is the process by which a pattern is written or transferred to a substrate. The process can be physical in nature, utilising a ‘stamp’ to press structures into a softer material, or chemical using light, ions or electron energy to write into photo and electron sensitive resists. This is necessary for the creation of the nanoscale components featured in nearly all modern technologies. ICN2 Nanofabrication Facility offers several different lithographic techniques and instruments, which are briefly listed and shown below.
|
Process |
Max. res. |
Energy used |
Instrument |
|---|---|---|---|
|
8nm |
30keV |
Raith eLINE Plus |
|
|
1um |
UV |
Kloé Dilase 250 |
|
|
2um |
UV |
Kloé KLUB 3 |
|
|
NA |
NA |
Laurell Tech. WS400BZ-6NPP LITE |