Nanofabrication facility - Equipment - Lithography

Lithography

Micro-nano lithography is the process by which a pattern is written or transferred to a substrate. The process can be physical in nature, utilising a ‘stamp’ to press structures into a softer material, or chemical using light, ions or electron energy to write into photo and electron sensitive resists. This is necessary for the creation of the nanoscale components featured in nearly all modern technologies. ICN2 Nanofabrication Facility offers several different lithographic techniques and instruments, which are briefly listed and shown below.

Process	Max. res.	Energy used	Instrument
Focused ion beam lithography	10nm	30kV Ga ions	Zeiss 1560XB Cross Beam*
Electron Beam Lithography (EBL)	50nm	30kV Electrons	Elphy Quantum (Inspect F50 FEI SEM based system)*
Nanoimprint lithography	25-50nm	Heat/pressure/UV	Obducat AB NIL-2.5
Direct Write Laser Lithography	1um	UV	Kloé Dilase 250
UV Photolithography (Mask aligner)	2um	UV	Kloé KLUB 3
Spin coater	NA	NA	Laurell Tech. WS400BZ-6NPP LITE

*systems located outside cleanroom area